CMP process control using spectroscopic on-line monitoring
by Particle Measuring Systems
In this application note, Particle Measuring Systems describes implementation of a very sensitive spectroscopic technique for monitoring CMP slurry particle size, which has been adapted for continuous, on-line sampling of undiluted CMP slurry.
| Published: | 2000 |
| Format: | |
| Length: | 8 pages |
| Type: | Application Note |
| Language: | English |
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